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METHOD FOR MANUFACTURING AN IMAGE SENSOR, CAPABLE OF PREVENTING A DARK DEFECT DUE TO PLASMA DAMAGE IN A TRENCH ETCH
METHOD FOR MANUFACTURING AN IMAGE SENSOR, CAPABLE OF PREVENTING A DARK DEFECT DUE TO PLASMA DAMAGE IN A TRENCH ETCH
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机译:制造图像传感器的方法,该图像传感器能够防止沟槽蚀刻中由于等离子体损坏而造成的黑暗缺陷
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摘要
PURPOSE: A method for manufacturing an image sensor is provided to perform a wet-etch process without attack to a desired inter insulating layer by using a poly film.;CONSTITUTION: A substrate(100) including a pixel region and a peripheral region is prepared. A light sensing unit is formed in the pixel region. An interlayer dielectric layer(120) and a wiring(130) are formed on the substrate in which the light sensing unit is formed. A hard mask pattern(140a) is formed on the interlayer dielectric layer and exposes the interlayer to the outside. The trench etching process is processed through a wet etching of the interlayer dielectric layer on the pixel region. The hard mask pattern is removed.;COPYRIGHT KIPO 2010
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