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PROCESS FOR PREPARING COPPER NANOWIRE AND COPPER NANOWIRE PREPARED BY THE SAME

机译:相同的铜纳米线的制备方法和铜纳米线的制备方法

摘要

PURPOSE: A method for manufacturing copper nanowire is provided to prepare the nanowire having a length of micrometers and a diameter of hundreds nanometer, to enable mass production, and to obtain economic effect. CONSTITUTION: A method for manufacturing copper nanowire comprises: mixing CuCl_2 solution with N,N,N',N'-tetramethylethylenediamine(TMEDA), a reducing agent, cetyl trimethyl ammonium bromide(CTAB), and a nonpolar organic solvent; moving the reaction solution to an autoclave and reacting the solution at 80-200C for 24 hours; and cooling the reaction solution at a room temperature; and obtaining the copper nanowire through a filtering process, a washing process, and a drying process.
机译:目的:提供一种制造铜纳米线的方法,以制备具有微米长度和数百纳米直径的纳米线,以实现批量生产并获得经济效果。组成:一种制造铜纳米线的方法,包括:将CuCl_2溶液与N,N,N',N'-四甲基乙二胺(TMEDA),还原剂,十六烷基三甲基溴化铵(CTAB)和非极性有机溶剂混合;将反应溶液移至高压釜中,并使溶液在80-200℃下反应24小时。将该反应溶液冷却至室温。通过过滤,洗涤,干燥得到铜纳米线。

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