首页> 外国专利> CMOS SRAM CAPABLE OF EASILY REDUCING THE SIZE OF A CELL AND IMPROVING THE ALIGNMENT MARGIN BETWEEN A GATE AND A BITLINE CONTACT NODE

CMOS SRAM CAPABLE OF EASILY REDUCING THE SIZE OF A CELL AND IMPROVING THE ALIGNMENT MARGIN BETWEEN A GATE AND A BITLINE CONTACT NODE

机译:CMOS SRAM能够轻松减小单元大小并改善门与位线接触点之间的对齐裕度

摘要

PURPOSE: A CMOS SRAM is provided to improve the alignment margin between a gate and a bitline contact node by aligning the word line of a pair of transistors which are arranged in the outermost part in a line.;CONSTITUTION: A plurality of memory cells are arranged in each cell region. A first transistor pair is arranged on a semiconductor substrate(100). A second transistor pair is arranged on the first layer of the upper part of the semiconductor substrate. A third transistor pair is arranged on the upper part of the first layer. A word line includes the gates of the third transistor pair and is arranged in a first direction in a line. A bit line pair(240) is arranged in order to cross the word line in a second direction.;COPYRIGHT KIPO 2010
机译:目的:提供一个CMOS SRAM,通过对齐排列在一条线中最外部的一对晶体管的字线来提高栅极和位线接触节点之间的对齐裕度;组成:多个存储单元排列在每个单元区域中。第一晶体管对布置在半导体衬底(100)上。第二晶体管对布置在半导体衬底的上部的第一层上。第三晶体管对布置在第一层的上部。字线包括第三晶体管对的栅极,并且在第一方向上沿一条线布置。布置位线对(240)以便在第二方向上与字线交叉。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20100088270A

    专利类型

  • 公开/公告日2010-08-09

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20090007386

  • 发明设计人 PARK HAN BYUNG;LIM HOON;CHO HOO SUNG;

    申请日2009-01-30

  • 分类号H01L27/11;H01L21/8244;G11C11/412;

  • 国家 KR

  • 入库时间 2022-08-21 18:32:08

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