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PILLAR ARRAY PLATFORM, METHOD OF MASK USING PILLAR ARRAY PLATFORM, AND METHOD OF TREATING SURFACE USING MASK
PILLAR ARRAY PLATFORM, METHOD OF MASK USING PILLAR ARRAY PLATFORM, AND METHOD OF TREATING SURFACE USING MASK
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机译:柱状阵列平台,使用柱状阵列平台的蒙版方法以及使用蒙版处理表面的方法
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摘要
PURPOSE: A pillar array platform, a manufacturing method of a mask using thereof, and a surface processing method using the mask are provided to secure the high pattern fidelity and the structural strength of a pillar. CONSTITUTION: A pillar array platform(100) for manufacturing a mask comprises the following: a substrate(110); and a pillar array formed with a pillar(120) including the aspect ratio of 5~30 on the substrate. The substrate includes a glass, a metal, silicon, or a polymer. The pillar is a cured material of a photo-crosslinkable adhesive composition. The pillar has the height of 1~6 millimeters, and the thickness of 100~1,000 micrometers.
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