ILLUMINATION CONTROL MODULE, A DIFFRACTION ILLUMINATION SYSTEM AND A PHOTOLITHOGRAPHY SYSTEM INCLUDING THE SAME, CAPABLE OF CONTROLLING AN ILLUMINATION ANGLE AND AREA IN A PHOTOLITHOGRAPHY PROCESS

摘要

PURPOSE: An illumination control module, a diffraction illumination system and a photolithography system including the same are provided to improve productivity in various photolithography processes by applying one diffraction lighting system to various photolithography process.;CONSTITUTION: An illumination control module(100) comprises an upper lens(110) and a lower lens(120). The upper lens has a swollen ring shape. The lower lens has a concave ring shape. The absolute value of a focus distance of the lower lens is different to that of the upper lens. The circular constant of the lower lens is same as that of the upper lens. The horizontal width of the lower lens is smaller than the that of the upper lens. The upper lens and lower lens are independently moved up and down.;COPYRIGHT KIPO 2011