首页> 外国专利> CONCERN IN WHICH THE CHANGE OF THE SURFACE SHAPE OCCURS VERY LOWS THE INSPECTING METHOD OF THE PHOTO MASK BLANK OR THEIR MANUFACTURE INTERMEDIATE AND METHOD FOR DESCRIMINATING QUALITY

CONCERN IN WHICH THE CHANGE OF THE SURFACE SHAPE OCCURS VERY LOWS THE INSPECTING METHOD OF THE PHOTO MASK BLANK OR THEIR MANUFACTURE INTERMEDIATE AND METHOD FOR DESCRIMINATING QUALITY

机译:考虑到表面形状变化的变化非常低,照片掩膜的检查方法或其制造中间体以及鉴别质量的方法

摘要

PURPOSE: The inspecting method of the photo mask blank or their manufacture intermediate and method for discriminating quality. The dimension error generation by the change of the surface shape can diminish.;CONSTITUTION: The inspecting method of the photo mask blank or their manufacture intermediate and method for discriminating quality. The surface shape of the photo mask blanks(101, 102) having the checking object of the stress film or their manufacture intermediate is measured. The checking object film is eliminated.;COPYRIGHT KIPO 2011
机译:目的:光掩模坯及其制造中间体的检验方法和鉴别质量的方法。可以减少由于表面形状变化而引起的尺寸误差。组成:光掩模坯料或它们的制造中间体的检验方法和质量鉴别方法。测量具有应力膜或其制造中间体的检查对象的光掩模坯料(101、102)的表面形状。取消检查对象胶片。; COPYRIGHT KIPO 2011

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