SURFACE SHAPE MEASUREMENT METHOD, MANUFACTURING METHOD OF MASK BLANK SUBSTRATE, MANUFACTURING METHOD OF MASK BLANK AND MANUFACTURING METHOD OF TRANSFER MASK

摘要

PROBLEM TO BE SOLVED: To provide a surface shape measurement method which highly accurately measures the surface shape of a substrate by correcting a systematic measurement error due to a surface shape measurement device, a manufacturing method of a mask blank substrate, a manufacturing method of a mask blank, and a manufacturing method of a transfer mask.SOLUTION: A surface shape measurement method measures the surface shape by: a step S1 of defining any of a measurement object substrate or a substrate having a larger main surface than that of the measurement object substrate as a reference substrate; a step S2 of defining any end surface of the reference substrate as a reference end surface; a first surface shape measurement step S3 of measuring the surface shape by erecting the reference substrate with the reference end surface facing downward and acquiring reference direction shape data; a second surface shape measurement step S4 of measuring the surface shape in two or more directions other than the direction in which the reference end surface faces downward and acquiring other direction shape data; a correction data acquisition step S5 of acquiring correction data on the basis of the mutual difference shape between the reference direction shape data and the other direction shape data; and a step S6 of correcting the surface shape measurement data of the main surface of the measurement object substrate using the correction data.SELECTED DRAWING: Figure 1