首页> 外国专利> GLOBAL PLANARIZATION METHOD FOR ELECTRODE OF CONTACT-TYPE CAPACITIVE SENSOR, WHICH FLATTENS AN ELECTRODE PATTERN, IN WHICH METAL IS FILLED, TOWARD A SUBSTRATE OF A NON-METALLIC MATERIAL

GLOBAL PLANARIZATION METHOD FOR ELECTRODE OF CONTACT-TYPE CAPACITIVE SENSOR, WHICH FLATTENS AN ELECTRODE PATTERN, IN WHICH METAL IS FILLED, TOWARD A SUBSTRATE OF A NON-METALLIC MATERIAL

机译:填充金属的接触型电容式传感器电极的整体平面化方法,向非金属材料的基质过渡

摘要

PURPOSE: A global planarization method for electrode of contact-type capacitive sensor, which flattens an electrode pattern, in which metal is filled, toward a substrate of a non-metallic material is provided to reduce signal noise by pattern collision.;CONSTITUTION: A global planarization method for electrode of contact-type capacitive sensor is as follows. Each substrate(100) of a moving element and a fixed element is etched in fixed shape. An electrode material(200) is filled in the etched place. CMP is performed until the filled electrode material has fixed depth. A coating layer is evaporated on the formed electrode. The substrate is composed of a glass wafer. The electrode material is made of chrome.;COPYRIGHT KIPO 2011
机译:目的:提供一种用于接触式电容传感器的电极的整体平面化方法,该方法可将填充有金属的电极图案朝非金属材料的基板展平,以减少图案碰撞产生的信号噪声。接触式电容传感器的电极的整体平坦化方法如下。将移动元件和固定元件的每个基板(100)蚀刻成固定形状。电极材料(200)填充在蚀刻位置。进行CMP直到填充的电极材料具有固定的深度。在形成的电极上蒸发涂层。基板由玻璃晶片组成。电极材料由铬制成。; COPYRIGHT KIPO 2011

著录项

  • 公开/公告号KR20100117832A

    专利类型

  • 公开/公告日2010-11-04

    原文格式PDF

  • 申请/专利权人 POSTECH ACADEMY-INDUSTRY FOUNDATION;

    申请/专利号KR20090036498

  • 发明设计人 MOON WON KYU;KANG DAE SIL;

    申请日2009-04-27

  • 分类号G01L1/14;H01L29/84;H01L21/304;

  • 国家 KR

  • 入库时间 2022-08-21 18:31:38

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