REFORMING METHOD OF A METAL PATTERN, AN ARRAY SUBSTRATE, AND A METHOD FOR MANUFACTURING THE ARRAY SUBSTRATE, CAPABLE OF INCREASING RELIABILITY OF PRODUCTIVITY AND MANUFACTURE PROCESSES

摘要

PURPOSE: A reforming method of a metal pattern, an array substrate, and a method for manufacturing the array substrate are provided to use an engraving pattern as an align mark, thereby increasing align reliability of the second wire pattern formed on an insulation substrate.;CONSTITUTION: The second photo pattern(300) is formed on the second wiring layer(130b). The second photo pattern uses an engraving pattern(114) as an align mark. The second buffer layer(120b) is actually the same as the first buffer layer. The second wiring layer is actually the same as the first wiring layer.;COPYRIGHT KIPO 2011