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Photoresist compositions comprising blends of ionic and non-ionic photoacid generators
Photoresist compositions comprising blends of ionic and non-ionic photoacid generators
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机译:包含离子型和非离子型光酸产生剂混合物的光致抗蚀剂组合物
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摘要
The invention provides new photoresist compositions that contain a resin binder and a blend of non-ionic and ionic PAGS. Preferred resists of the invention preferably are imaged with 248 nm and/or 193 nm exposure wavelengths to provide highly resolved small dimension features.
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