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Npt - semiconductor component in the form of a first and second mosfets or igbts

机译:NPT-第一和第二MOSFET或IGBT形式的半导体组件

摘要

Npt - semiconductor component in the form of a first and second mosfets or igbts with– a drift zone (9) is of a first conductivity type;– a on the one side of the drift zone (9) and designed to the drift zone (9) adjacent further semiconductor zone (3, 11) from one to the first conductivity type opposite second conductivity type, wherein the further semiconductor zone (3, 11) a higher maximum dopant concentration than the drift zone (9) and is connected to a contact plane;– a on the other, to the one side opposite side of the drift zone (9) designed rear zone (10, pages);– a when a static the upshot of breakage voltage of the npt - semiconductor component between the contact plane and back sides zone (10) remaining neutral drift zones field (14) between a within the drift zone (9) formed part of a space charge zone (rlz) and the rear sides zone (10) is arranged:– within the neutral drift zones area (14) comprises a compensation zone (15) is embedded which, starting from the same conductivity type as the drift zone (9), and a in the comparison..
机译:Npt-具有第一和第二mosfet或igbt形式的半导体组件,具有-漂移区(9)为第一导电类型;-a在漂移区(9)的一侧并设计为漂移区( 9)从一个到与第二导电类型相反的第一导电类型与另一个半导体区域(3、11)相邻,其中另一个半导体区域(3、11)的最大掺杂剂浓度比漂移区域(9)高,并且与接触平面;-另一侧,在漂移区(9)设计的后部区域的相对一侧(10页);-a静态时npt的击穿电压上升-触点之间的半导体组件平面和后侧区域(10)剩余的中性漂移区域(14)在由空间电荷区(rlz)组成的漂移区(9)内和后侧区域(10)之间布置:漂移区区域(14)包括一个补偿区(15),该补偿区从相同的导体开始定性类型作为漂移区(9),并且在比较中为a。

著录项

  • 公开/公告号DE102005061294B4

    专利类型

  • 公开/公告日2010-05-12

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE20051061294

  • 发明设计人

    申请日2005-12-21

  • 分类号H01L29/739;H01L29/06;H01L29/78;

  • 国家 DE

  • 入库时间 2022-08-21 18:29:06

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