首页> 外国专利> Method for the determination of the topology by the substrate and a coordinates - measuring machine caused by the systematic error during the vermesung of positions of the edges of the structures of a substrate

Method for the determination of the topology by the substrate and a coordinates - measuring machine caused by the systematic error during the vermesung of positions of the edges of the structures of a substrate

机译:由基片和由坐标测量机确定的拓扑结构的方法,该坐标测量机是由基片结构边缘的位置的垂直定位期间的系统误差引起的

摘要

Method for the determination of the topology by the substrate and a coordinates - measuring machine systematic error caused in the measurement of positions of the edges of structures (3) of a substrate (2), wherein the substrate (2) in a measuring table (20) by means of three stopping points (30) is in a plane which is characterized by the following steps:– that on a plurality of positions on a surface (2a) of the substrate (2) in each case a position in the x -, y - and z - coordinate direction is measured;– that the substrate (2) to an x / y - plane of the coordinates - measuring machine parallel axis (70) is inclined, and a of the supporting points (30) a spacer element (35) is placed, so that an inclined position is adjusted, wherein the substrate (2) in order to the parallel axis (70) to the x / y - plane (20a) of the coordinates - measuring machine is inclined;– that the position in the x -, y - and z - coordinate direction at least one edge (3a) to the plurality of the positions of the structures on the surface..
机译:通过衬底和在测量衬底(2)的结构(3)的边缘的位置的测量中引起的坐标测量机系统误差来确定拓扑的方法,其中衬底(2)在测量台中(通过三个停止点(20)在一个平面内,该平面的特征在于以下步骤:–在衬底(2)的表面(2a)上的多个位置上,分别在x方向上的一个位置-,y-和z-坐标方向被测量;-基板(2)相对于x / y平面-坐标-测量机平行轴(70)倾斜,并且支撑点(30)a放置间隔元件(35),从而调整倾斜位置,其中基板(2)以平行轴(70)相对于坐标-测量机的x / y-平面(20a)倾斜; – x-,y-和z-上的位置将至少一个边(3a)坐标到多个位置表面上的结构。

著录项

  • 公开/公告号DE102007036815B4

    专利类型

  • 公开/公告日2010-03-04

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE20071036815

  • 发明设计人

    申请日2007-08-03

  • 分类号G01B11/03;G01B21/04;

  • 国家 DE

  • 入库时间 2022-08-21 18:29:03

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