Device for treating large substrates, e.g. glass plates, in a plasma comprises a vacuum chamber with a gas-permeable plasma sleeve which imitates the outer contour of a substrate, an antenna arrangement and further plasma-producing units

摘要

Device for treating large substrates in a plasma comprises a vacuum chamber (1) with a gas-permeable plasma sleeve (3) which imitates the outer contour of a substrate (2), an antenna arrangement as plasma source for radiating electromagnetic waves and further plasma-producing units for forming a locally defined plasma in a defined region in front of the surface of the substrate so that an overlay plasma with defined plasma density distribution is formed in the defined region. An independent claim is also included for a method for operating the above device. Preferred Features: The antenna arrangement radiates microwaves with frequencies of 300 MHz to 100 GHz, preferably 915 MHz or 2.45 GHz. The further plasma-producing units include a plasma source, a plasma source based on waveguides or injected electrodes or a magnetic unit.