Microlithographic projection exposure system has lightening system with multi-mirror array for adjusting intensity distribution in pupil level

摘要

The microlithographic projection exposure system has a lightening system (10) with a multi-mirror array (22) for adjusting an intensity distribution in a pupil level (30). The lightening system has mirror angle determination electronics, which is designed such that a vector length of the vector is determined. The vector is rotated in a coordinate system successively on the coordinate axis of the coordinate system. An independent claim is included for a method for operating the microlithographic projection exposure system.