Illumination system for microlithography-projection exposure system used during manufacturing of e.g. LCD, has aperture formed for generating preset correction of intensity distribution produced by mirror array in pupil shaping surfaces

摘要

The system (190) has a multiple-mirror array with mirrors for producing a preset intensity distribution in pupil shaping surfaces (110, 145) of the system. A lens aperture (210) is arranged in or near to the pupil shaping surfaces of the system. The aperture is formed for generating a preset correction of intensity distribution produced by multiple-mirror array in the pupil shaping surfaces. A masking device (122) is provided for masking a reticle (160), and a masking lens (140) is provided for imaging the masking device on the reticle. An independent claim is also included for a method for illuminating an illumination field.