Illumination lens for use in microlithography-projection illumination system during manufacturing dynamic RAM, has filters e.g. neutral gray filter, and polarization filters arranged in or adjacent to pupil plane arranged after glass bar

摘要

The lens has an diffractive optical raster element (8) e.g. zoom lens, inputting illumination angle distribution on an object field by angular influence of illumination light (7) such that a dipole setting, a quadripole setting and a multipole setting exist in a pupil plane (15), which is arranged before a glass bar (19). Filters (25, 26) e.g. neutral gray filter, and polarization filters e.g. thin film polarizer, are arranged in or adjacent to a pupil plane (23), which is arranged after the bar, for selective attenuation of an intensity spot of the illumination light. An independent claim is also included for a projection illumination system including an illumination system.