Extreme UV mirror arrangement for use as e.g. pupil facet mirror arranged in region of pupil plane of e.g. illumination system, has multilayer arrangement including active layer arranged between entrance surface and substrate

摘要

The arrangement (100) has mirror elements (110-112) connected to each other for jointly forming a mirror surface (115) of the arrangement. A multilayer arrangement (130) is applied on a substrate (120), and includes reflective effect with respect to radiation from an extreme UV range (EUV). The multilayer arrangement includes an active layer (140) arranged between a radiation entrance surface and the substrate, where thickness (z) of the layer is altered by an action of an electric field. A provision is made of an electrode arrangement for generating the field acting on the layer. The active layer is a pulsed laser deposition layer. The mirror surface is a flat mirror surface, plane mirror surface or curved mirror surface such as convex mirror surface, concave mirror surface and cylindrical mirror surface. The substrate is a metal substrate, silicon substrate and a glass substrate. An independent claim is also included for a method for operating an optical system.