Fluid i.e. ultra-pure water, temperature stabilizing device for use during manufacturing of chips from silicon wafers, has reservoir lying in flow path of fluid and containing volume of fluid, where supplied fluid passes through reservoir

摘要

The device has a lithography device attached to a fluid treatment unit by a line. A reservoir (1) lies in a flow path of the fluid and contains a volume of the fluid, where the supplied fluid passes through the reservoir. The reservoir includes an inlet (4) attached to a supply line (6). The inlet of the reservoir is connected to an immersion pipe (7), which extends inside a reservoir housing (2). The immersion pipe ends with a distance to a base (8) and a cover (3) of the reservoir housing. An inner wall (11) of the reservoir housing is free of edges. An independent claim is also included for a method for stabilizing temperature of fluid during manufacturing of chips.