A method for determining a repair the form of a defect on or in the vicinity of an edge of a substrate of a photomask

摘要

The invention relates to a method for determining a repair the form of (60, 260) of a defect (30, 200) on or in the vicinity of an edge (32, 232) of a substrate (100) comprising the steps of the scanning of the defect (30, 200) with a scanning probe microscope for determining a three-dimensional contour (40, 240) of the defect (30, 200), the scanning of the defect (30, 200) with a raster portion chen a microscope for determining the course (50, 250) of the at least one edge (32, 232) of the substrate (100) and of determining the repair the form of (60, 260) of the defect (30, 200) comprises a combination of the three-dimensional contour (40, 240) and the course (50, 250) of the at least one edge (32, 232).