首页> 外国专利> Reduction of the threshold value voltage fluctuation in transistors with a channel half conductor alloy by reducing the separating speeds unequal to moderately

Reduction of the threshold value voltage fluctuation in transistors with a channel half conductor alloy by reducing the separating speeds unequal to moderately

机译:通过减小不相等的分离速度来降低带有沟道半导体合金的晶体管的阈值电压波动

摘要

A threshold value - that develops semiconductor material, for example a silicon / germanium - alloy, is in a selective manner for a type of the transistors on the basis of a better separating provided as a function of the equal to moderately. For this purpose, the semiconductor alloy on the active areas of all transistors and is subsequently deposited on the basis of a well controllable structuring diagram structured. Consequently, a threshold value can be reduced degrees of.
机译:基于作为等于或中等的函数而提供的更好的分离,对于一种晶体管的类型,以选择性的方式选择性地产生阈值,该阈值产生半导体材料,例如硅/锗合金。为此,将半导体合金沉积在所有晶体管的有源区域上,然后根据结构良好的可控制结构图进行沉积。因此,可以减小阈值的程度。

著录项

  • 公开/公告号DE102008063402A1

    专利类型

  • 公开/公告日2010-07-08

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE20081063402

  • 发明设计人

    申请日2008-12-31

  • 分类号H01L21/8234;H01L21/20;H01L27/088;

  • 国家 DE

  • 入库时间 2022-08-21 18:28:34

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