首页> 外国专利> Optical element e.g. facet, positioning device for use in e.g. field facet mirror for extreme-ultraviolet micro lithography, has alignment rod and actuation mechanism that are actuated, such that orientation of optical element is changed

Optical element e.g. facet, positioning device for use in e.g. field facet mirror for extreme-ultraviolet micro lithography, has alignment rod and actuation mechanism that are actuated, such that orientation of optical element is changed

机译:光学元件刻面,定位装置,例如用于用于极紫外微光刻的场刻面镜,具有被致动的对准杆和致动机构,从而改变了光学元件的方向

摘要

The device (1) has a storage rack (4) including a storage area (6) for storing an optical element (2) in different orientation, where the storage area is formed in truncated conical shape, angular shape, wedge-shape, or truncated pyramid shape. An alignment rod (3) and an actuation mechanism (5) are actuated by actuation force, such that the orientation of the element is changed, where the alignment rod and the actuation mechanism are self-lockably implemented. The actuation mechanism includes two rotary cylinders (9, 10) arranged into each other. An independent claim is also included for a mirror element including a mirror with a spherical segment-shaped storage area.
机译:装置(1)具有包括用于以不同方向存储光学元件(2)的存储区域(6)的存储架(4),其中该存储区域形成为截头圆锥形,角形,楔形或截锥体形状。对准杆(3)和致动机构(5)通过致动力被致动,使得元件的方向改变,其中对准杆和致动机构被自锁地实现。致动机构包括彼此布置的两个旋转缸(9、10)。对于镜元件也包括独立的权利要求,该镜元件包括具有球形分段形状的存储区域的镜。

著录项

  • 公开/公告号DE102009035192A1

    专利类型

  • 公开/公告日2010-08-05

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT AG;

    申请/专利号DE20091035192

  • 发明设计人 MAJOR ANDRAS;

    申请日2009-07-29

  • 分类号G02B7/00;G02B7/198;

  • 国家 DE

  • 入库时间 2022-08-21 18:28:13

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