Array substrate for display device e.g. LCD device, has pixel electrode arranged on passivation film, that contacts drain electrode and barrier metal layer through contact hole formed by etching passivation film

摘要

The array substrate has a gate electrode (103) of a thin film transistor (TFT), that is connected to the gate wiring formed on transparent substrate (101). A gate insulating layer (105) is formed on gate electrode, where the barrier metal layer (109) is formed between the source and drain electrodes (111a,111b) of TFT. The passivation film (115) is formed enclosing the TFT, gate and data wirings. A pixel electrode (123a) arranged on passivation film is made to contact drain electrode and barrier layer through a contact hole formed by etching the passivation film. An independent claim is included for fabrication method of array substrate of display device.