Transparent substrate useful in photovoltaic industry, comprises an electrically conductive oxide layer, which has a specified thickness and a surface having a texturing with a specified range of aspect ratio and/or roughness

摘要

The transparent substrate (1) comprises an electrically conductive oxide layer (2), which has a thickness of 100-1500 nm and a surface having a texturing that has an aspect ratio (T/B) of 2/3 to 1/15 and/or a roughness of 40-140 nm. The texturing contains structures having a magnitude of 20 nm to 1 mu m, and has a rounded profile in central cross section. The substrate has a surface of greater than 19 m 2, and is made of glass and/or heat-stable synthetic materials. A portion (more than 19%) of the substrate surface is coated. The conductive oxide layer has a veil of 15%. The transparent substrate (1) comprises an electrically conductive oxide layer (2), which has a thickness of 100-1500 nm and a surface having a texturing that has an aspect ratio (T/B) of 2/3 to 1/15 and/or a roughness of 40-140 nm. The texturing contains structures having a magnitude of 20 nm to 1 mu m, and has a rounded profile in central cross section. The substrate has a surface of greater than 19 m 2, and is made of glass and/or heat-stable synthetic materials. A portion (more than 19%) of the substrate surface is coated. The conductive oxide layer has a veil of 15%, an oxygen-enriched covering layer and a transmission of greater than 75% for electromagnetic waves of wavelength 300-1200 nm. An independent claim is included for a process for manufacturing a transparent substrate coated with a transparent electrically conductive oxide layer.