首页> 外国专利> SUBSTRATE OVERLAPPING DEVICE, SUBSTRATE HOLDER, SUBSTRATE OVERLAPPING SYSTEM, METHOD OF OVERLAPPING SUBSTRATE, METHOD OF MANUFACTURING DEVICE, AND APPARATUS AND METHOD FOR JOINING SUBSTRATE

SUBSTRATE OVERLAPPING DEVICE, SUBSTRATE HOLDER, SUBSTRATE OVERLAPPING SYSTEM, METHOD OF OVERLAPPING SUBSTRATE, METHOD OF MANUFACTURING DEVICE, AND APPARATUS AND METHOD FOR JOINING SUBSTRATE

机译:基板重叠装置,基板保持器,基板重叠系统,基板重叠方法,制造装置,装置及基板接合方法

摘要

PROBLEM TO BE SOLVED: To align and overlap substrates.;SOLUTION: A substrate overlapping device includes: a temperature control unit for generating a temperature difference between a first substrate and a second substrate; and an overlap unit for alternately aligning and overlapping the first substrate and the second substrate while deformation generated in at least one of the first and second substrates caused by a temperature difference is maintained. In the substrate overlapping device, the temperature control unit may generate a temperature difference between a partial region of the first substrate and the second substrate. Also, the substrate overlapping device includes a calculation unit for making a plurality of alignment indexes provided on the first substrate and a plurality of alignment indexes provided on the second substrate calculate a target position of overlapping where the amount of the positional misalignment of the respective indexes to a reference position is minimized when the first substrate overlaps with the second substrate. The temperature control unit may decide the partial region based on a result calculated by the calculation unit.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:使基板对准和重叠。解决方案:基板重叠装置包括:温度控制单元,用于在第一基板和第二基板之间产生温度差;以及重叠单元,用于交替地对准和重叠第一基板和第二基板,同时保持由温度差在第一基板和第二基板中的至少一个中产生的变形。在基板重叠装置中,温度控制单元可以在第一基板的部分区域和第二基板之间产生温度差。而且,基板重叠装置包括计算单元,用于使设置在第一基板上的多个对准指标和设置在第二基板上的多个对准指标计算重叠的目标位置,其中各个指标的位置未对准量当第一基板与第二基板重叠时,使相对于参考位置的角度最小。温度控制单元可以基于由计算单元计算出的结果来决定局部区域。COPYRIGHT:(C)2012,JPO&INPIT

著录项

  • 公开/公告号JP2011216832A

    专利类型

  • 公开/公告日2011-10-27

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP20100094183

  • 申请日2010-04-15

  • 分类号H01L21/02;H01L21/683;

  • 国家 JP

  • 入库时间 2022-08-21 18:25:35

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号