首页> 外国专利> LIQUID-PHASE LASER ABLATION APPARATUS AND LIQUID-PHASE LASER ABLATION METHOD USING THE SAME

LIQUID-PHASE LASER ABLATION APPARATUS AND LIQUID-PHASE LASER ABLATION METHOD USING THE SAME

机译:液相激光烧蚀装置及使用该方法的液相激光烧蚀方法

摘要

PPROBLEM TO BE SOLVED: To provide a liquid-phase laser ablation apparatus which allows to apply laser ablation treatment continuously and stably in a liquid phase and to have high efficiency enough for producing particles by the liquid-phase laser ablation treatment. PSOLUTION: This invention relates to the liquid-phase laser ablation apparatus which is used for irradiating a target 14 in a solvent 13 with a laser beam L to perform laser ablation in the liquid phase, and the liquid-phase laser ablation apparatus includes: a laser oscillator 10 for generating the laser beam L; a treatment vessel 12 which has the laser beam L-transmissible bottom B and is used for holding the solvent 13; and the target 14 arranged on the bottom B of the treatment vessel 12. The treatment vessel 12 is arranged so that the target 14 is irradiated with the laser beam L transmitted through the bottom B of the treatment vessel 12. PCOPYRIGHT: (C)2011,JPO&INPIT
机译:

要解决的问题:提供一种液相激光烧蚀设备,该设备允许在液相中连续且稳定地进行激光烧蚀处理,并且具有足够高的效率以通过液相激光烧蚀处理产生颗粒。解决方案:本发明涉及一种液相激光烧蚀设备,该液相激光烧蚀设备用于向溶剂13中的靶材14照射激光束L以在液相中进行激光烧蚀,以及该液相激光烧蚀设备包括:激光振荡器10,用于产生激光束L;处理容器12,其具有激光L可透过的底部B,用于保持溶剂13。靶14布置在处理容器12的底部B上。处理容器12布置成使得靶14被透射通过处理容器12的底部B的激光束L照射。 C)2011,日本特许厅

著录项

  • 公开/公告号JP2011161379A

    专利类型

  • 公开/公告日2011-08-25

    原文格式PDF

  • 申请/专利权人 TOYOTA CENTRAL R&D LABS INC;

    申请/专利号JP20100027490

  • 发明设计人 NISHI TEPPEI;

    申请日2010-02-10

  • 分类号B01J19/12;B23K26/12;B23K26/14;B23K26/36;B02C19/18;

  • 国家 JP

  • 入库时间 2022-08-21 18:25:14

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