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CMOS IMAGE SENSOR BIG VIA BONDING PAD APPLICATION FOR AlCu PROCESS

机译:CMOS图像传感器通过键合焊盘在AlCu工艺中的应用

摘要

PPROBLEM TO BE SOLVED: To provide a CMOS image sensor big via bonding pad application for AlCu process. PSOLUTION: An integrated circuit includes a substrate having a bonding pad region and a non-bonding pad region. A relatively large via, called a "big via", is formed on the substrate in the bonding region. The big via has a first dimension in a top view toward the substrate. The integrated circuit also has a plurality of vias formed on the substrate in the non-bonding region. The plurality of vias each have a second dimension in the top view and the second dimension is considerably smaller than the first dimension. PCOPYRIGHT: (C)2011,JPO&INPIT
机译:

要解决的问题:为CMOS图像传感器提供较大的通孔焊盘,用于AlCu工艺。解决方案:集成电路包括具有键合焊盘区域和非键合焊盘区域的基板。在接合区域中的基板上形成相对较大的通孔,称为“大通孔”。大通孔在俯视图中具有朝向衬底的第一尺寸。集成电路还具有在非结合区域中的基板上形成的多个通孔。多个通孔在俯视图中均具有第二尺寸,并且第二尺寸远小于第一尺寸。

版权:(C)2011,日本特许厅&INPIT

著录项

  • 公开/公告号JP2011035399A

    专利类型

  • 公开/公告日2011-02-17

    原文格式PDF

  • 申请/专利权人 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD;

    申请/专利号JP20100170162

  • 发明设计人 TSENG UWAY;WU LIN-JUNE;LIN YU-TING;

    申请日2010-07-29

  • 分类号H01L21/3205;H01L23/52;H01L27/146;H01L27/14;H01L21/768;H01L21/60;

  • 国家 JP

  • 入库时间 2022-08-21 18:24:20

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