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SILICA CONCENTRATION MEASUREMENT APPARATUS AND SILICA CONCENTRATION MEASUREMENT METHOD

机译:二氧化硅浓度测定装置及二氧化硅浓度测定方法

摘要

PROBLEM TO BE SOLVED: To quickly and precisely measure a silica concentration by taking into consideration a density influence of a phosphoric acid with respect to the silica concentration by a simple device constitution without using a reagent such as a molybdate ion.;SOLUTION: A silica concentration measurement apparatus is characterized by obtaining an analytical curve indicating a correspondence relationship among a light intensity signal in a first light detecting section 3, a light intensity signal in a second light detecting section 4, and the silica concentration based on the phosphoric acid concentration in a phosphoric acid solution, and by calculating the silica concentration from the analytical curve, the light intensity signal in the first light detecting section 3, and the light intensity signal in the second light detecting section 4.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:在不使用诸如钼酸根离子的试剂的情况下,通过简单的装置构造,通过考虑磷酸相对于二氧化硅浓度的密度影响来快速而精确地测量二氧化硅浓度。浓度测定装置的特征在于,基于该溶液中的磷酸浓度,求出表示第一光检测部3的光强度信号,第二光检测部4的光强度信号,二氧化硅浓度之间的对应关系的解析曲线。磷酸溶液,并通过分析曲线计算二氧化硅浓度,第一光检测部分3中的光强度信号和第二光检测部分4中的光强度信号;版权所有:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP2011117747A

    专利类型

  • 公开/公告日2011-06-16

    原文格式PDF

  • 申请/专利权人 HORIBA ADVANCED TECHNO CO LTD;

    申请/专利号JP20090273132

  • 发明设计人 UCHIMURA KOJI;MIYAGAKI SHUN;

    申请日2009-12-01

  • 分类号G01N21/49;G01N21/64;

  • 国家 JP

  • 入库时间 2022-08-21 18:24:19

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