CAF2-MGF2 BINARY SINTERED COMPACT AND METHOD FOR MANUFACTURING PLASMA-PROOF FLUORIDE SINTERED COMPACT

摘要

PROBLEM TO BE SOLVED: To provide a plasma-proof fluoride sintered compact suitable for a component to which the high plasma-proof characteristics are required when used in an apparatus for manufacturing a silicon semiconductor, a compound semiconductor or the like.;SOLUTION: The plasma-proof fluoride sintered compact comprises a CaF₂-MgF₂ sintered compact containing MgF₂ of 1 to 5 wt.% and has a dense structure having bulk density of the sintered compact of 3.00 g/cm³ or more.;COPYRIGHT: (C)2011,JPO&INPIT