首页> 外国专利> SEMICONDUCTOR DEVICE, INTEGRATED CIRCUIT, MATRIX CIRCUIT, DISPLAY ELEMENT, RADIO COMMUNICATION APPARATUS, ELECTRONIC APPARATUS, AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE, INTEGRATED CIRCUIT, MATRIX CIRCUIT, DISPLAY ELEMENT, RADIO COMMUNICATION APPARATUS, ELECTRONIC APPARATUS, AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE

机译:半导体器件,集成电路,矩阵电路,显示元件,无线电通信设备,电子设备以及制造半导体设备的方法

摘要

PROBLEM TO BE SOLVED: To provide an organic semiconductor device free from damages to an organic semiconductor layer having proper on/off ratio regardless of the presence of a source/drain electrode formed through etching process.;SOLUTION: The semiconductor device is constituted of a substrate 1, a gate electrode 2 formed on the substrate 1, a gate insulating layer 3 formed on the gate electrode 2 and the substrate 1, a p-type organic semiconductor layer 4 formed on the gate insulating layer 3, a protective layer 5 formed on the p-type organic semiconductor layer 4, and a source electrode 8 and a drain electrode 9 formed on the protective layer 5.;COPYRIGHT: (C)2011,JPO&INPIT
机译:要解决的问题:要提供一种有机半导体器件而不会损坏具有适当通/断比的有机半导体层,而与通过蚀刻工艺形成的源/漏电极的存在无关。衬底1,形成在衬底1上的栅电极2,形成在栅电极2和衬底1上的栅绝缘层3,形成在栅绝缘层3上的p型有机半导体层4,形成的保护层5在p型有机半导体层4上形成源极8和在保护层5上形成漏极9。版权所有:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP2011119529A

    专利类型

  • 公开/公告日2011-06-16

    原文格式PDF

  • 申请/专利权人 SONY CORP;

    申请/专利号JP20090276618

  • 发明设计人 SASAKI MARI;ONO HIDEKI;

    申请日2009-12-04

  • 分类号H01L29/786;H01L51/05;H01L21/28;H01L29/417;G06K19/07;G06K19/077;G02F1/1368;

  • 国家 JP

  • 入库时间 2022-08-21 18:24:04

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号