Ni ALLOY ELECTRODE FILM HAVING EXCELLENT RESISTIVITY STABILITY IN REPEATED HEATING, AND SPUTTERING TARGET FOR Ni ALLOY ELECTRODE FILM FORMATION

摘要

PROBLEM TO BE SOLVED: To provide an Ni alloy electrode film which has low electric resistance, and also has excellent resistivity stability in a repeated heating environment, and a sputtering target for forming the Ni alloy electrode film.;SOLUTION: The Ni alloy electrode film having excellent resistivity stability in repeated heating is formed on a substrate, which has a composition composed of W of 0.5 to 2.0 atomic%, and the balance Ni with inevitable impurities, and whose resistivity is ≤30 μΩcm. Further, the sputtering target for forming the Ni alloy electrode film has a composition composed of 0.5 to 2.0 atomic% W, and the balance Ni with inevitable impurities, and is used for forming an electrode film exposed to repeated heating.;COPYRIGHT: (C)2011,JPO&INPIT