SUBSTRATE HAVING MULTILAYER REFLECTION FILM, REFLECTION TYPE MASK BLANKS FOR EXPOSURE AND REFLECTION TYPE MASK FOR EXPOSURE, AND METHOD OF MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a substrate having a multilayer reflection film suppressed the generation of particles caused by the peeling of the conductive film and abnormal discharge at the electrostatic chucking of substrate provided with the conductive film, a high quality reflection type mask blanks for exposure having less surface defects caused by particles, and a high quality reflective type mask for exposure having no defect pattern caused by particles.;SOLUTION: The substrate 10 having a multilayer reflection film has a multilayer reflection film 3 on a substrate 1 for reflecting exposed light, and has a conductive film 2 formed on the side opposite to the multilayer reflection film 3 holding the substrate 1, and in a region except at least the peripheral portion of the substrate 1. The conductive film 2 comprises a material containing for example chromium (Cr). The conductive film 2 contains nitrogen (N) in the substrate 1 side, and contains at least one of oxygen (O) or carbon (C) in the surface side. A reflective type mask blanks for exposure is given by forming an absorber film for absorbing the exposure light on the multilayer reflection film 3 of the substrate 10 having the multilayer reflection film. The reflection type mask for exposure is given by forming a pattern on the absorber film of the reflective mask blanks for exposure.;COPYRIGHT: (C)2011,JPO&INPIT