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In the treatment liquid distribution system which supplies the aforementioned treatment liquid vis-a-vis the module which does substrate treatment the treatment liquid distribution system, treatment liquid supply
In the treatment liquid distribution system which supplies the aforementioned treatment liquid vis-a-vis the module which does substrate treatment the treatment liquid distribution system, treatment liquid supply
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机译:相对于对进行了基板处理的模块的处理液分配系统供给上述处理液的处理液分配系统中,处理液供给
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摘要
PROBLEM TO BE SOLVED: To remove gas dissolved in a processing solution with ease and reduce its cost, in a processing solution supply system for supplying the processing solution to a module for performing substrate processing using the processing solution.;SOLUTION: The processing solution supply system comprises a processing solution supply source 20 in which a processing solution is contained, a processing solution storage tank 21 filled with the processing solution supplied from the processing solution supply source 20 for feeding the processing solution to the module, processing solution storage tank vibration means 24 for vibrating the processing solution in the processing solution storage tank 21, an exhaust pipe 30 connected with the processing solution storage tank 21 for exhausting gas foamed from the processing solution in the processing solution storage tank 21, a valve V1 provided in the course of the exhaust pipe 30 for opening and closing the exhaust pipe 30, and gas detection means 23 for detecting the gas passing between the processing solution storage tank 21 and the valve V1 in the exhaust pipe 30.;COPYRIGHT: (C)2008,JPO&INPIT
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