After restoration the ion in the relic defective section

摘要

PROBLEM TO BE SOLVED: To provide a method for surely confirming only a remaining defect part 5 of a shifter on a monitor screen and performing correction by using an FIB device of a conventional technique so as to solve the problem that a boundary of the remaining defect part 5 of the shifter and a transparent substrate 2 around it can not be clearly recognized on a screen of a correcting device and only the remaining defect part 5 of the shifter can not be accurately irradiated with an ion beam. SOLUTION: In a method of correcting a remaining defect of a phase shift mask provided with a zirconium silicide compound material film as a phase shifter patterned in a desired shape on an upper surface of the transparent substrate, a correction method for a halftone type phase shift mask is characterized in that after filling gallium ions in the remaining defect part, a position of the remaining defect part is specified and the remaining defect part is removed and corrected by irradiating the remaining defect part with a converged ion beam.