首页> 外国专利> Plating film connecting terminal member, a connection terminal with this, plating film material and the multilayer plating material used for this, as well as processes for the preparation of the plating film connecting terminal member

Plating film connecting terminal member, a connection terminal with this, plating film material and the multilayer plating material used for this, as well as processes for the preparation of the plating film connecting terminal member

机译:镀膜连接端子构件,与其连接的端子,镀膜材料和用于该镀膜材料的多层镀材料,以及制备镀膜连接端子构件的方法

摘要

PROBLEM TO BE SOLVED: To provide a connecting terminal member capable of suppressing or preventing the occurrence of whisker while suppressing the quantity of a rare metal to be used and improving both of solderability (wettability) to lead-free solder and slidability.;SOLUTION: The connecting terminal member is formed by reflowing a multilayer plated material having a first plating layer comprising tin or a tin alloy on the outside of the conductive base material and a second plating layer comprising indium on the first plating layer. The thickness of the first plating layer in a connection/disconnection part of the connecting terminal member is controlled to 0.3-3 m, the thickness in the soldered part of the connecting terminal member is controlled to be thicker than that of the connection/disconnection part and the thickness of the second plating layer is controlled to 0.05-0.2 m.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种连接端子构件,其能够抑制或防止晶须的产生,同时抑制所使用的稀有金属的量,并改善对无铅焊料的可焊性(润湿性)和滑动性。通过使多层镀覆材料回流来形成连接端子构件,该多层镀覆材料具有在导电性基材的外侧上的包括锡或锡合金的第一镀层和在第一镀层上的包括铟的第二镀层。将连接端子构件的连接/断开部分中的第一镀层的厚度控制为0.3-3m,将连接端子构件的焊接部中的厚度控制为比连接/断开部分的厚度厚。第二镀层的厚度控制在0.05-0.2 m之间。版权所有:(C)2011,日本特许厅

著录项

  • 公开/公告号JP4632380B2

    专利类型

  • 公开/公告日2011-02-23

    原文格式PDF

  • 申请/专利权人

    申请/专利号JP20090135575

  • 发明设计人

    申请日2009-06-04

  • 分类号C25D5/10;C25D5/16;C25D5/50;C25D7;H01R13/03;

  • 国家 JP

  • 入库时间 2022-08-21 18:20:23

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