Pollution prevention equipment, pollution prevention method, exposure apparatus, and method of manufacturing a patterned wafer

摘要

The present invention conveniently pollution control devices that can prevent the contamination of the EUV mask, pollution prevention method, and an exposure apparatus, and to provide a method of manufacturing a patterned wafer using the same. A pollution control device according to one aspect of the invention, a light source for generating the following vacuum ultraviolet light wavelengths 166nm, EUV mask 108 with a beam of vacuum ultraviolet light from a light source housed in the EUV exposure apparatus 101 an optical system (mirrors 104a, 104b, etc.) to be irradiated with it is that a. As the light source, it can be used and a laser oscillator 110 for emitting a molecular fluorine laser, argon dimer, a VUV-ASE generator 210 for emitting spontaneous emission amplified light from krypton dimer or molecular fluorine. [Selection Figure] Figure 2