首页> 外国专利> Irradiating laser light to patterning manner of the thin film, and the substrate where the production mannered null

Irradiating laser light to patterning manner of the thin film, and the substrate where the production mannered null

机译:以薄膜的构图方式照射激光,生产方式为空的基板

摘要

PROBLEM TO BE SOLVED: To provide a method of patterning excellent in yield by simply stabilizing laser workability, a manufacturing method of a thin film solar cell utilizing the same, and a patterning device for thin film patterning.;SOLUTION: The method of patterning patterns a thin film by irradiating the front surface side of a substrate on which the thin film is formed with laser beams. The substrate is held by a plurality of holding members abutting on the rear surface side of the substrate on which the thin film is not formed. When an area on the thin film on the front surface side of the substrate equivalent to an area on which the holding member is abutted is irradiated with light, a tip abutting on the rear surface side of the substrate of the holding member is movable downward or along the surface of the substrate. In addition, the manufacturing method of the thin film solar cell utilizing the same, and the patterning device for the thin film patterning are provided.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种通过简单地稳定激光可加工性而具有优异的图案形成方法,利用该图案形成方法的薄膜太阳能电池的制造方法以及用于薄膜图案形成的图案形成装置。通过用激光束照射形成有薄膜的基板的正面侧来形成薄膜。基板由抵接在未形成薄膜的基板的背面侧的多个保持构件保持。当对基板的前表面侧的薄膜上的与被抵接于保持构件的区域相等的区域照射光时,抵接在保持构件的基板的后表面侧上的顶端可以向下方或下方移动。沿基材表面。另外,提供了利用该方法制造的薄膜太阳能电池的制造方法以及用于薄膜图案化的图案形成装置。版权所有:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP4646532B2

    专利类型

  • 公开/公告日2011-03-09

    原文格式PDF

  • 申请/专利权人 シャープ株式会社;

    申请/专利号JP20040067529

  • 发明设计人 立花 伸介;福岡 裕介;

    申请日2004-03-10

  • 分类号H01L31/04;

  • 国家 JP

  • 入库时间 2022-08-21 18:17:17

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