首页> 外国专利> Universal dual charge-retaining transistor flash NOR cell, a dual charge-retaining transistor flash NOR cell array, and method for operating same

Universal dual charge-retaining transistor flash NOR cell, a dual charge-retaining transistor flash NOR cell array, and method for operating same

机译:通用双电荷保持晶体管闪速NOR单元阵列,双电荷保持晶体管闪速NOR单元阵列及其操作方法

摘要

A NOR flash memory cell is formed of dual serially connected charge retaining transistors. A drain/source of a first of the dual charge retaining transistors connected to a local bit line and a source/drain of a second of the dual charge retaining transistors connected to a local source line. The drain/sources of the commonly connected dual serially connected charge retaining transistors are connected solely together. The drain/sources and source drains are formed in a diffusion well. In some embodiments, the diffusion well is formed in a deep diffusion well. The dual serially connected charge retaining transistors are N-channel or P-channel charge retaining transistors with the charge retaining layers being either floating gate or SONOS charge trapping layers. Selected charge retaining transistors are programmed by a combination of a band-to-band tunneling and a Fowler-Nordheim tunneling and erased by a Fowler Nordheim tunneling.
机译:NOR闪存单元由双串联的电荷保持晶体管形成。连接到局部位线的双电荷保持晶体管中的第一个的漏极/源极和连接到局部源线的双电荷保持晶体管中的第二个的源极/漏极。共同连接的双串联电荷保持晶体管的漏极/源极仅连接在一起。漏极/源极和源极漏极形成在扩散阱中。在一些实施例中,扩散阱形成在深扩散阱中。双串联电荷保持晶体管是N沟道或P沟道电荷保持晶体管,其电荷保持层是浮栅或SONOS电荷俘获层。选定的电荷保持晶体管是通过带间隧道和Fowler-Nordheim隧道的组合进行编程的,并通过Fowler Nordheim隧道进行擦除。

著录项

  • 公开/公告号US2011085382A1

    专利类型

  • 公开/公告日2011-04-14

    原文格式PDF

  • 申请/专利权人 PETER WUNG LEE;FU-CHANG HSU;

    申请/专利号US20100925010

  • 发明设计人 FU-CHANG HSU;PETER WUNG LEE;

    申请日2010-10-12

  • 分类号G11C16/04;H01L29/792;

  • 国家 US

  • 入库时间 2022-08-21 18:15:32

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