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STAGE EQUIPPED WITH ALIGNMENT FUNCTION, PROCESSING APPARATUS HAVING THE STAGE EQUIPPED WITH ALIGNMENT FUNCTION, AND METHOD OF ALIGNING SUBSTRATE
STAGE EQUIPPED WITH ALIGNMENT FUNCTION, PROCESSING APPARATUS HAVING THE STAGE EQUIPPED WITH ALIGNMENT FUNCTION, AND METHOD OF ALIGNING SUBSTRATE
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机译:具有校正功能的阶段,具有具有校正功能的阶段的处理设备以及对基板进行称呼的方法
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摘要
There is provided an inexpensive stage which is equipped with an alignment function and is capable of easily performing high-accuracy alignment especially in a θ direction even in case an object to be processed is large in weight. The stage equipped with an alignment function has a stage main body for holding a substrate while leaving a processing surface thereof open to access. The stage is provided with: a suction means capable of sucking that surface of the substrate which lies opposite to the processing surface; a gas supply means for supplying a gas to such a region of the substrate as is other than a portion sucked by the suction means; and a drive means to give a rotating force to the suction means so that the substrate can be rotated on the same plane by causing the suction means to serve as the center of rotation.
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