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Substrate for growing single crystal diamond layer and method for producing single crystal diamond substrate

机译:用于生长单晶金刚石层的衬底和用于生产单晶金刚石衬底的方法

摘要

The present invention is a substrate for growing a single crystal diamond layer including: at least, a base material made of a single crystal diamond, and an iridium film or a rhodium film heteroepitaxially grown on a side of the base material where the single crystal diamond layer is to be grown; wherein a peripheral end portion of a surface of the base material on the side where the single crystal diamond layer is to be grown is chamfered with a curvature radius (r), the curvature radius satisfying (r)≧50 μm. As a result, there is provided a substrate for growing a single crystal diamond layer and a method for producing a single crystal diamond substrate, the substrate and the method in which a single crystal diamond having uniform and high crystallinity can be reproducibly produced at low cost.
机译:本发明是用于生长单晶金刚石层的基板,该基板至少包括:由单晶金刚石制成的基材;以及在该单晶金刚石所在的一侧上异质外延生长的铱膜或铑膜。层要生长;其中,基材的要生长单晶金刚石层的一侧的表面的外围端部以曲率半径(r)倒角,该曲率半径满足(r)≥50μm。结果,提供了一种用于生长单晶金刚石层的基板以及一种用于生产单晶金刚石基板的方法,该基板和方法能够以低成本再现地制造具有均匀且高结晶度的单晶金刚石。 。

著录项

  • 公开/公告号US2010294196A1

    专利类型

  • 公开/公告日2010-11-25

    原文格式PDF

  • 申请/专利权人 HITOSHI NOGUCHI;

    申请/专利号US20100662616

  • 发明设计人 HITOSHI NOGUCHI;

    申请日2010-04-26

  • 分类号C30B25/20;B32B3/02;

  • 国家 US

  • 入库时间 2022-08-21 18:13:39

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