首页> 外国专利> APPLICATION METHOD OF SILICON POWDER AND RAW MATERIAL SILICON BRICK WITH GOOD FILLING PROPERTY IN MONO-CRYSTAL FURNACE OR MULTI-CRYSTAL FURNACE (amended)

APPLICATION METHOD OF SILICON POWDER AND RAW MATERIAL SILICON BRICK WITH GOOD FILLING PROPERTY IN MONO-CRYSTAL FURNACE OR MULTI-CRYSTAL FURNACE (amended)

机译:具有良好填充性能的硅粉和原料硅砖在单晶炉或多晶炉中的应用方法(修订)

摘要

An application method of silicon powder and raw material silicon brick with good filling property in a mono-crystal or a multi-crystal furnace involves pressing silicon powder having a particle size of 0.1 to 100 micrometers into silicon brick having weighing 0.2 to 2,000,000 grams by cold or hot isostatic pressing, then charging it into a mono-crystal or multi-crystal furnace. The pressure range of cold isostatic pressing is 10 MPa to 800 MPa. The pressure range of hot isostatic pressing is 10 Mpa to 800 Mpa. The temperature range for the method is 30° C. to 1,400° C.; The raw material silicon brick is used as the original raw material of silicon crystal growth in the production of solar cells or semiconductor.
机译:具有良好填充性能的硅粉和原料硅砖在单晶炉或多晶炉中的应用方法包括将颗粒尺寸为0.1至100微米的硅粉冷压成重0.2至2,000,000克的硅砖。或热等静压,然后将其装入单晶或多晶炉中。冷等静压的压力范围为10 MPa至800 MPa。热等静压的压力范围是10 Mpa至800 Mpa。该方法的温度范围是30℃至1,400℃。硅砖原料被用作太阳能电池或半导体生产中硅晶体生长的原始原料。

著录项

  • 公开/公告号US2011027159A1

    专利类型

  • 公开/公告日2011-02-03

    原文格式PDF

  • 申请/专利权人 TAO ZHANG;YUEPENG WAN;DEJING ZHONG;

    申请/专利号US20090811270

  • 发明设计人 TAO ZHANG;DEJING ZHONG;YUEPENG WAN;

    申请日2009-06-22

  • 分类号C01B33/021;C01B33/02;C04B35/653;

  • 国家 US

  • 入库时间 2022-08-21 18:11:52

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