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Method for fabricating self-aligned nanostructure using self-assembly block copolymers, and structures fabricated therefrom
Method for fabricating self-aligned nanostructure using self-assembly block copolymers, and structures fabricated therefrom
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机译:使用自组装嵌段共聚物制造自对准纳米结构的方法以及由其制备的结构
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摘要
In one embodiment, the present invention provides a method for patterning a surface that includes forming a block copolymer atop a heterogeneous reflectivity surface, wherein the block copolymer is segregated into first and second units; applying a radiation to the first units and second units, wherein the heterogeneous reflectivity surface produces an exposed portion of the first units and the second units; and applying a development cycle to selectively remove at least one of the exposed first and second units of the segregated copolymer film to provide a pattern.
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