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System and method for defect localization on electrical test structures
System and method for defect localization on electrical test structures
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机译:用于电气测试结构上的缺陷定位的系统和方法
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摘要
A method and system for defect localization includes: (i) receiving a test structure that includes at least one conductor that is at least partially covered by an electro-optically active material; (ii) providing an electrical signal to the conductor, such as charge at least a portion of the conductor; and (iii) imaging the test structure to locate a defect.
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