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Spacer fill structure, method and design structure for reducing device variation
Spacer fill structure, method and design structure for reducing device variation
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机译:减少器件变化的垫片填充结构,方法和设计结构
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摘要
A design structure is provided for spacer fill structures and, more particularly, spacer fill structures, a method of manufacturing and a design structure for reducing device variation is provided. The structure includes a plurality of dummy fill shapes in different areas of a device which are configured such that gate perimeter to gate area ratio will result in a total perimeter density being uniform across a chip.
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