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Photo-masks and methods of fabricating surface-relief grating diffractive devices
Photo-masks and methods of fabricating surface-relief grating diffractive devices
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机译:光掩模和制造表面浮雕光栅衍射器件的方法
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摘要
Photo-masks for fabricating surface-relief grating diffractive devices and methods of fabricating surface-relief grating diffractive devices are described. The photo-mask can include refractive elements and/or diffractive elements contained in or on a body element. The photo-mask can be used to simultaneously produce multiple surface-relief grating diffractive devices in a recording material. The photo-mask enables the surface-relief grating diffractive devices to be produced in large quantities while significantly reducing the cost and labor required.
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