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Plasma processing installation, influenced by a magnetic field, for processing a continuous material or a workpiece
Plasma processing installation, influenced by a magnetic field, for processing a continuous material or a workpiece
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机译:等离子加工设备,受磁场影响,用于加工连续材料或工件
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摘要
An installation for the plasma processing of a continuous material (1) includes an evacuatable discharge chamber (3a, 3b) and a device for setting a gas atmosphere in the discharge chamber (3a, 3b). The device for setting a gas atmosphere includes a prechamber system (10, 11, 12) and a postchamber system (2), with sluice openings between the chambers (2, 3a, 3b, 10, 11, 12). The continuous material (1) is guided with low friction through the prechamber system (10, 11, 12) and the postchamber system (2). The device for setting a gas atmosphere includes a recovery system wherein gas can be recirculated from a postchamber (2a . . . 2k) into a prechamber (10, 11, 12) and/or postchamber (2a . . . 2k) having a higher pressure level so that processing is effected in a gas-saving manner.
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机译:用于连续材料( 1 B>)的等离子体处理的设备包括可抽空的放电室( 3 B> a I> ,3 B > b I>)和用于在放电室中设置气体气氛的设备( 3 B> a I> ,3 B> b I>)。设置气体气氛的设备包括前室系统( 10、11、12 B>)和后室系统( 2 B>),在室之间设有闸门开口( 2,3 B> a I> ,3 B> b I> ,10,11,12 B>)。连续材料( 1 B>)以低摩擦力被引导通过前室系统( 10、11、12 B>)和后室系统( 2 B>) 。用于设定气体气氛的设备包括回收系统,其中气体可以从后室( 2 B> a I> .. 2 B> k I>)放入前室( 10、11、12 B>)和/或后室( 2 B> a I> )。 2 B> k I>)具有较高的压力水平,从而以节省气体的方式进行处理。
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