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A method to form both high and low-K materials in one plane on a substrate, and their application in mixed mode circuits
A method to form both high and low-K materials in one plane on a substrate, and their application in mixed mode circuits
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机译:一种在基板上的一个平面上同时形成高K和低K材料的方法及其在混合模式电路中的应用
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摘要
A new method of provided for forming in one plane layers of insulating material having both high and low dielectric constants. Layers, having selected and preferably non-identical parameters of dielectric constants, are successively deposited interspersed with layers of etch stop material. The layers can be etched, creating openings there-through that can be filled with a layer of choice.
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