FABRICATION METHOD OF ANTI-REFLECTIVE NANOSTRUCTURE AND FABRICATION METHOD OF OPTICAL DEVICE WITH INTEGRATED ANTI-REFLECTIVE NANOSTRUCTURES

摘要

The present invention relates to a fabrication method of an anti-reflective nanostructure and a fabrication method of an optical device with integrated anti-reflective nanostructures. The fabrication method of an optical device comprises: depositing a metal thin film over a substrate; thermally treating the metal thin film to transform the film into metal particles; and etching the front surface of the substrate by employing the metal particles as a mask, so as to form an anti-reflective nanostructure in a wedge shape having a sharp point or in a parabolic shape with a sub-optical wavelength cycle on the top surface of the substrate itself. Therefore, the present invention can advantageously simplify the fabrication process, minimize light reflection caused by a difference in refractive indexes between air and a semiconductor material and facilitate the implementation in optical device applications.