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CONTACT CONFIGURATIONS FOR MEMS RELAYS AND MEMS SWITCHES AND METHOD FOR MAKING SAME
CONTACT CONFIGURATIONS FOR MEMS RELAYS AND MEMS SWITCHES AND METHOD FOR MAKING SAME
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机译:MEMS继电器和MEMS开关的接触式配置及其制造方法
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摘要
Micro-electromechanical (MEMS) contact configuration is proposed comprising a static contact (3) with at least one contact surface (19a’, 19b’) and a movable contact (2) with at least one corresponding contact surface (19a, 19b). Particularly flat contact surfaces and correspondingly low contact resistance can be achieved, if at least one contact surface plane is formed by a crystal plane of the wafer. Furthermore a method for manufacturing such a contact configuration is proposed, wherein the contact surfaces are obtained by wet anisotropic etching of a silicon wafer, if need be preceded by appropriate masking to expose the to be edged regions only, if need be followed by coating with an electrically conductive layer (5), preferentially a metal layer.
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