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POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION FOR INTERLAYER INSULATING FILM, INTERLAYER INSULATING FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE
POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION FOR INTERLAYER INSULATING FILM, INTERLAYER INSULATING FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE
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机译:用于层间绝缘膜,层间绝缘膜,有机EL显示设备和液晶显示设备的正型光敏树脂组合物
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摘要
PURPOSE: A positive type photosensitive resin composition for an interlayer insulating film is provided to ensure high transparency and excellent insulation property when baked at a high temperature. CONSTITUTION: A positive type photosensitive resin composition for an interlayer insulating film comprises: (A) an alkali soluble resin including an acrylic repeating unit; (B) a 1,2-quinonediazide compound; and (C) a compound with at least two partial structures represented by chemical formula (I), which has 600-2000 of molecular weight. In chemical formula (I), R^1 and R^2 are independently show a methyl group or tert-butyl group, wherein at least one of R^1 and R^2 is a tert-butyl group; and R^3 is -O- or -NH-.
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