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METHOD FOR VERIFYING OPTICAL PROXIMITY CORRECTION, CAPABLE OF ELIMINATING A JOG PATTERN GENERATED FROM AN OPTICAL PROXIMITY CORRECTION OPERATION
METHOD FOR VERIFYING OPTICAL PROXIMITY CORRECTION, CAPABLE OF ELIMINATING A JOG PATTERN GENERATED FROM AN OPTICAL PROXIMITY CORRECTION OPERATION
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机译:验证光学近程校正的方法,该方法能够消除由光学近程校正操作产生的点动模式
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摘要
PURPOSE: A method for verifying optical proximity correction is provided to obtain the margin of a photo-lithography process by eliminating unnecessary pattern generated after an optical proximity correction operation.;CONSTITUTION: A non-overlapped pattern with respect to the database pattern of a taped out semiconductor design is separated after an optical proximity correction verification with respect to the database pattern is completed. Each area of the non-overlapped pattern is calculated. A job pattern is a violated pattern based on mask-rule-check and is separated from the non-overlapped pattern. The job pattern is eliminated from the database pattern.;COPYRIGHT KIPO 2011
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